{
    "identifier": "ark:\/88434\/mds2-3843",
    "accessLevel": "public",
    "contactPoint": {
        "hasEmail": "mailto:[email protected]",
        "fn": "Bryan Barnes"
    },
    "programCode": [
        "006:045"
    ],
    "landingPage": "https:\/\/data.nist.gov\/od\/id\/mds2-3843",
    "title": "Lab-based multi-wavelength EUV diffractometry for critical dimension metrology",
    "description": "This data set provides the measurement data from EUV diffractometry, simulated fits to these data, and parametric values and uncertainties from these fits as first reported in Barnes et al., \"Lab-based multi-wavelength EUV diffractometry for critical dimension metrology\", Proc. SPIE 134261V (2025).  These values and uncertainties for parametric geometries have been determined from these EUV diffractometry data using a tabletop coherent high- harmonic generation (HHG) source for four line-space arrays with CDs below 50 nm. An EUV imaging reflectometer has captured the 0th order reflection and the 1st order diffraction intensities as functions of grazing angle. The 1st order intensities are functions of five wavelengths from the spectral comb of this HHG source. Fits to these data using rigorous couple-wave analysis (RCWA) electromagnetic simulations yield parametric values and uncertainties. EUV diffractometry simulations match well in general with the measured data after accounting for cross-sectional geometry and experimental conditions.",
    "language": [
        "en"
    ],
    "distribution": [
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/mds2-3843\/optical_files%2FSilicon_interpolated_PALIK.txt",
            "mediaType": "text\/plain",
            "title": "optical_files\/Silicon_interpolated_PALIK"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/mds2-3843\/optical_files%2FSiO2_interpolated_PALIK.txt",
            "mediaType": "text\/plain",
            "title": "optical_files\/SiO2_interpolated_PALIK"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/mds2-3843\/README.txt",
            "mediaType": "text\/plain",
            "title": "README"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/mds2-3843\/FitMeMasked.py",
            "mediaType": "text\/x-python",
            "title": "FitMeMasked"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/mds2-3843\/fit_jac.npy",
            "mediaType": "application\/octet-stream",
            "title": "fit_jac"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/mds2-3843\/Analysis.ipynb",
            "mediaType": "application\/octet-stream",
            "title": "Analysis"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/mds2-3843\/BundayLS_fullheight",
            "mediaType": "application\/octet-stream",
            "title": "BundayLS_fullheight"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/mds2-3843\/fit_x.npy",
            "mediaType": "application\/octet-stream",
            "title": "fit_x"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/ark:\/88434\/mds2-3843\/FinalData\/L52P104_full.csv",
            "mediaType": "text\/csv"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/mds2-3843\/minimizer_base_masked.py",
            "mediaType": "text\/x-python",
            "title": "minimizer_base_masked"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/mds2-3843\/README_Fits.txt",
            "mediaType": "text\/plain",
            "title": "README_Fits"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/ark:\/88434\/mds2-3843\/FinalData\/L50P100_full.csv",
            "mediaType": "text\/csv"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/ark:\/88434\/mds2-3843\/FinalData\/L50P100_full.csv.sha256",
            "mediaType": "text\/plain"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/ark:\/88434\/mds2-3843\/FinalData\/L52P104_full.csv.sha256",
            "mediaType": "text\/plain"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/ark:\/88434\/mds2-3843\/FinalData\/L55P110_full.csv",
            "mediaType": "text\/csv"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/ark:\/88434\/mds2-3843\/FinalData\/L55P110_full.csv.sha256",
            "mediaType": "text\/plain"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/ark:\/88434\/mds2-3843\/FinalData\/L57P114_full.csv",
            "mediaType": "text\/csv"
        },
        {
            "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/ark:\/88434\/mds2-3843\/FinalData\/L57P114_full.csv.sha256",
            "mediaType": "text\/plain"
        }
    ],
    "bureauCode": [
        "006:55"
    ],
    "modified": "2025-07-10 00:00:00",
    "publisher": {
        "@type": "org:Organization",
        "name": "National Institute of Standards and Technology"
    },
    "theme": [
        "Metrology:Dimensional metrology",
        "Nanotechnology:Nanometrology",
        "Manufacturing:Process measurement and control"
    ],
    "keyword": [
        "extreme ultraviolet (EUV)",
        "EUV diffractometry",
        "EUV scatterometry"
    ]
}