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NIST Electron Effective-Attenuation-Length Database - SRD 82

The NIST Electron Effective Attenuation Length Database provides values of electron effective attenuation lengths (EALs) in materials at user-selected electron energies between 50 eV and 2,000 eV. The database was designed mainly to provide EALs (to account for effects of elastic-electron scattering) for measurements of the thicknesses of overlayer films and, to a much lesser extent, for measurements of the depths of thin marker layers. EALs are calculated using an algorithm based on electron transport theory for measurement conditions specified by the user. A critical review on the EAL has been published [A. Jablonski and C. J. Powell, Surf. Science Reports 47, 33 (2002)], and simple practical expressions for the EAL, mean escape depth, and information depth are given in another paper by the same authors [J. Vac. Sci. Technol. A 27, 253 (2009)].

About this Dataset

Updated: 2024-02-22
Metadata Last Updated: 2011-01-01 00:00:00
Date Created: N/A
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Auger electron spectroscopy
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Title NIST Electron Effective-Attenuation-Length Database - SRD 82
Description The NIST Electron Effective Attenuation Length Database provides values of electron effective attenuation lengths (EALs) in materials at user-selected electron energies between 50 eV and 2,000 eV. The database was designed mainly to provide EALs (to account for effects of elastic-electron scattering) for measurements of the thicknesses of overlayer films and, to a much lesser extent, for measurements of the depths of thin marker layers. EALs are calculated using an algorithm based on electron transport theory for measurement conditions specified by the user. A critical review on the EAL has been published [A. Jablonski and C. J. Powell, Surf. Science Reports 47, 33 (2002)], and simple practical expressions for the EAL, mean escape depth, and information depth are given in another paper by the same authors [J. Vac. Sci. Technol. A 27, 253 (2009)].
Modified 2011-01-01 00:00:00
Publisher Name National Institute of Standards and Technology
Contact mailto:[email protected]
Keywords Auger electron spectroscopy , ESCA , XPS , depth distribution function , effective attenuation length , electron spectroscopy for chemical analysis , material database , photoelectron , photoelectron spectroscopy , photoemission , surface analysis , x-ray photoelectron spectroscopy
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