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Optical scattering measurements and simulation data for one-dimensional (1-D) patterned periodic sub-wavelength features

This data set consists of both measured and simulated optical intensities scattered off periodic line arrays, with simulations based upon an average geometric model for these lines. These data were generated in order to determine the average feature sizes based on optical scattering, which is an inverse problem for which solutions to the forward problem are calculated using electromagnetic simulations after a parameterization of the feature geometry. Here, the array of features measured and modeled is periodic in one-dimension (i.e., a line grating) with a nominal line width of 100 nm placed at 300 nm intervals, or pitch = 300 nm; the short-hand label for the features is "L100P300." The entirety of the modeled data is included, over two thousand simulations that are indexed using a top, middle, and bottom linewidth as floating parameters. Two subsets of these data, featuring differing sampling strategies, are also provided. This data set also contains angle-resolved optical measurements with uncertainties for nine arrays which differ in their dimensions due to lithographic variations using a focus/exposure matrix, as identified in a previous publication (https://doi.org/10.1117/12.777131). We have previously reported line widths determined from these measurements based upon non-linear regression to compare theory to experiment. Machine learning approaches are to be fostered for solving such inverse problems. Data are formatted for direct use in "Model-Based Optical Metrology in R: MoR" software which is also available from data.nist.gov. (https://doi.org/10.18434/T4/1426859). Note: Certain commercial materials are identified in this dataset in order to specify the experimental procedure adequately. Such identification is not intended to imply recommendation or endorsement by the National Institute of Standards and Technology, nor is it intended to imply that the materials are necessarily the best available for the purpose.

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Updated: 2022-07-29
Metadata Last Updated: 2020-08-14
Date Created: N/A
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National Institute of Standards and Technology
Dataset Owner: N/A

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Title Optical scattering measurements and simulation data for one-dimensional (1-D) patterned periodic sub-wavelength features
Description This data set consists of both measured and simulated optical intensities scattered off periodic line arrays, with simulations based upon an average geometric model for these lines. These data were generated in order to determine the average feature sizes based on optical scattering, which is an inverse problem for which solutions to the forward problem are calculated using electromagnetic simulations after a parameterization of the feature geometry. Here, the array of features measured and modeled is periodic in one-dimension (i.e., a line grating) with a nominal line width of 100 nm placed at 300 nm intervals, or pitch = 300 nm; the short-hand label for the features is "L100P300." The entirety of the modeled data is included, over two thousand simulations that are indexed using a top, middle, and bottom linewidth as floating parameters. Two subsets of these data, featuring differing sampling strategies, are also provided. This data set also contains angle-resolved optical measurements with uncertainties for nine arrays which differ in their dimensions due to lithographic variations using a focus/exposure matrix, as identified in a previous publication (https://doi.org/10.1117/12.777131). We have previously reported line widths determined from these measurements based upon non-linear regression to compare theory to experiment. Machine learning approaches are to be fostered for solving such inverse problems. Data are formatted for direct use in "Model-Based Optical Metrology in R: MoR" software which is also available from data.nist.gov. (https://doi.org/10.18434/T4/1426859). Note: Certain commercial materials are identified in this dataset in order to specify the experimental procedure adequately. Such identification is not intended to imply recommendation or endorsement by the National Institute of Standards and Technology, nor is it intended to imply that the materials are necessarily the best available for the purpose.
Modified N/A
Publisher Name National Institute of Standards and Technology
Contact mailto:bryan.barnes@nist.gov
Keywords electromagnetic simulations , simulations , experimental , angle-resolved scattering , scattering , gratings , patterned semiconductors , semiconductors , scatterfield microscopy , bright-field microscopy , microscopy , inverse problems , machine learning
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        "https:\/\/dx.doi.org\/10.1117\/12.827676",
        "https:\/\/dx.doi.org\/10.1364\/AO.51.006196",
        "https:\/\/dx.doi.org\/10.1088\/1361-6501\/aa5586",
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    "title": "Optical scattering measurements and simulation data for one-dimensional (1-D) patterned periodic sub-wavelength features",
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            "mediaType": "text\/plain",
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            "mediaType": "application\/vnd.ms-excel",
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            "mediaType": "text\/plain",
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            "mediaType": "image\/png",
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        },
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            "mediaType": "text\/plain",
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            "mediaType": "image\/png",
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        {
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        {
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            "mediaType": "application\/vnd.ms-excel",
            "title": "y_L100P300_Die1_exp.csv"
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            "format": "comma-separated values",
            "description": "467 x 3 matrix of parametric values used as inputs the scattering code for simulation.  Values in nanometers. Formatted for use in M.o.R., this is a subset of the larger dataset.",
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            "title": "Pi_L100P300_sim_467.csv"
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    ],
    "license": "https:\/\/www.nist.gov\/open\/license",
    "bureauCode": [
        "006:55"
    ],
    "rights": "Certain commercial materials are identified in this dataset in order to specify the experimental procedure adequately.  Such identification is not intended to imply recommendation or endorsement by the National Institute of Standards and Technology, nor i",
    "modified": "2020-08-14 00:00:00",
    "publisher": {
        "@type": "org:Organization",
        "name": "National Institute of Standards and Technology"
    },
    "accrualPeriodicity": "irregular",
    "theme": [
        "Nanotechnology:Nanometrology",
        "Metrology:Dimensional metrology",
        "Manufacturing:Process measurement and control"
    ],
    "issued": "2021-01-05",
    "keyword": [
        "electromagnetic simulations",
        "simulations",
        "experimental",
        "angle-resolved scattering",
        "scattering",
        "gratings",
        "patterned semiconductors",
        "semiconductors",
        "scatterfield microscopy",
        "bright-field microscopy",
        "microscopy",
        "inverse problems",
        "machine learning"
    ]
}

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