These are the unprocessed electron back scatter diffraction patterns (EBSPs) collected from the mesas of electron beam induced deposition (EBID) material, in addition to the Mathematica notebook used to process the images. Each of the 12 EBID mesa has 10 EBSPs collected at 20 kV and 10 kV, in addition to several longer line scans that step from the silicon substrate onto the EBID mesa.
About this Dataset
Title | Supporting Data for Selected Area Electron Beam Induced Deposition of Pt and W for EBSD Backgrounds |
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Description | These are the unprocessed electron back scatter diffraction patterns (EBSPs) collected from the mesas of electron beam induced deposition (EBID) material, in addition to the Mathematica notebook used to process the images. Each of the 12 EBID mesa has 10 EBSPs collected at 20 kV and 10 kV, in addition to several longer line scans that step from the silicon substrate onto the EBID mesa. |
Modified | 2018-10-17 |
Publisher Name | National Institute of Standards and Technology |
Contact | mailto:[email protected] |
Keywords | Electron Back Scatter Diffraction , EBSD , flat field , background subtraction , Electron Beam Induced Deposition , EBID , Pt , W |
{ "identifier": "77D21EEB60F37A2BE053245706819FDB1978", "accessLevel": "public", "contactPoint": { "hasEmail": "mailto:[email protected]", "fn": "William Osborn" }, "programCode": [ "006:045" ], "landingPage": "https:\/\/data.nist.gov\/od\/id\/77D21EEB60F37A2BE053245706819FDB1978", "title": "Supporting Data for Selected Area Electron Beam Induced Deposition of Pt and W for EBSD Backgrounds", "description": "These are the unprocessed electron back scatter diffraction patterns (EBSPs) collected from the mesas of electron beam induced deposition (EBID) material, in addition to the Mathematica notebook used to process the images. Each of the 12 EBID mesa has 10 EBSPs collected at 20 kV and 10 kV, in addition to several longer line scans that step from the silicon substrate onto the EBID mesa.", "language": [ "en" ], "distribution": [ { "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/77D21EEB60F37A2BE053245706819FDB1978\/20kV-mesas.zip", "mediaType": "application\/zip" }, { "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/77D21EEB60F37A2BE053245706819FDB1978\/20kV-mesas.zip.sha256", "mediaType": "text\/plain" }, { "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/77D21EEB60F37A2BE053245706819FDB1978\/afmOfMesas.zip", "mediaType": "application\/zip" }, { "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/77D21EEB60F37A2BE053245706819FDB1978\/10kV-lineScans.zip", "mediaType": "application\/zip" }, { "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/77D21EEB60F37A2BE053245706819FDB1978\/10kV-mesas.zip", "mediaType": "application\/zip" }, { "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/77D21EEB60F37A2BE053245706819FDB1978\/10kV-mesas.zip.sha256", "mediaType": "text\/plain" }, { "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/77D21EEB60F37A2BE053245706819FDB1978\/20kV-lineScans.zip", "mediaType": "application\/zip" }, { "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/77D21EEB60F37A2BE053245706819FDB1978\/20kV-lineScans.zip.sha256", "mediaType": "text\/plain" }, { "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/77D21EEB60F37A2BE053245706819FDB1978\/readme.txt", "mediaType": "text\/plain" }, { "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/77D21EEB60F37A2BE053245706819FDB1978\/readme.txt.sha256", "mediaType": "text\/plain" }, { "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/77D21EEB60F37A2BE053245706819FDB1978\/10kV-lineScans.zip.sha256", "mediaType": "text\/plain" }, { "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/77D21EEB60F37A2BE053245706819FDB1978\/fibColoring.nb", "mediaType": "application\/mathematica" }, { "downloadURL": "https:\/\/data.nist.gov\/od\/ds\/77D21EEB60F37A2BE053245706819FDB1978\/fibColoring.nb.sha256", "mediaType": "text\/plain" }, { "accessURL": "https:\/\/doi.org\/10.18434\/T4\/1503158", "format": "text\/html", "description": "DOI Access to Supporting Data for Selected Area Beam Induced Deposition of Pt and W for EBSD Background", "title": "DOI Access to Supporting Data for Selected Area Beam Induced Deposition of Pt and W for ..." } ], "bureauCode": [ "006:55" ], "modified": "2018-10-17", "publisher": { "@type": "org:Organization", "name": "National Institute of Standards and Technology" }, "theme": [ "Materials:Materials characterization", "Nanotechnology:Nanomechanics", "Nanotechnology:Nanometrology", "Electronics:Semiconductors" ], "keyword": [ "Electron Back Scatter Diffraction", "EBSD", "flat field", "background subtraction", "Electron Beam Induced Deposition", "EBID", "Pt", "W" ] }